Silicone Sputtering Targets
Shape: discs, plate, rod, tube, sheet, Delta, and per drawing
Specification:
Diameter: 355.6mm (14") max.
Single piece Size: Length: <254mm, Width: <127mm, Thickness: >1mm
Made sputtering targets method:
hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
If larger size than this is needed, we can also provide tiles joint by 45 degree or 90 degree.
We have only listed popular materials. Please feel free to contact us with any special requirements.
Silicone Sputtering Targets
| Name | Purity | |
|---|---|---|
| Chromium Silicone | CrSi2 | 99.5% |
| Cobalt Silicide | Co3Si (CoSi2) | 99% |
| Hafnium silicide | HfSi2 | 99.5% |
| Molybdenum Silicide | MoSi2 Mo5Si3 | 99% |
| Molybdenum Silicide | MoSi2 | 99.5% |
| Nickel silicide | NiSi2 | 99% |
| Niobium Silicide | NbSi2 (Nb5Si3) | 99% |
| Tantalum silicide | TaSi2 | 99.5% |
| Tantalum silicide | Ta5Si3 (Ta5Si2) | 99.5% |
| Titanium Silicide | TiSi2, Ti5Si3 | 99.5% |
| Tungsten Silicide | WSi2 | 99.5% |
| Vanadium silicide | VSi2 | 99.5% |
| Vanadium silicide | V3Si | 99.5% |
| Zirconium Silicon | ZrSi2 | 99.5% |