Oxide Sputtering Targets


Shape we provide: discs, plate, rod, tube, sheet, Delta, and per drawing

Sputtering targets manufacturing method:

Hot pressing (HP), hot / cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

Spezifications:

Diameter: 355.6mm (14 ") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness:> 1mm,

If larger size than this, we can do it as tiles joint by 45 degree or 90 degree.

We have only listed popular materials. Please feel free to contact us with any special requirements.

Oxide Sputtering Targets

Oxide Sputtering Oxide Sputtering Oxide Sputtering
Aluminum Oxide Al2O3 Indium Zinc Oxide IZO Tantalum Pentoxide Ta2O5
Aluminum Zinc Oxide Al2O3-ZnO (AZO) Iron Oxide Fe2O3 Terbium Oxide Tb4O7
Antimony Oxide Sb2O3 Lanthanum Oxide La2O3 Thulium Oxide Tm2O3
Barium Titanate BaTiO3 Lead Oxide PbO Tin Dioxide Sb: SnO2 (ATO)
Bismuth Oxide Bi2O3 Lead Zirconate Titanate PbZrTiO3(PZT) Titanium Oxide TiO
Cerium Oxide CeO2 Lutetium Oxide Lu2O3 Titanium Dioxide TiO2
Chromium Oxide Cr2O3 Magnesium Oxide MgO Titanium Oxide Ti2O3
Copper Oxide CuO Molybdenum Oxide MoO3 Tungsten Oxide WO3
Dysprosium Oxide Dy2O3 Neodymium Oxide Nd2O3 Vanadium Oxide V2O5
Erbium Oxide Er2O3 Nickel Oxide NiO Ytterbium Oxide Yb2O3
Europium Oxide Eu2O3 Niobium Pentoxide Nb2O5 Yttrium oxide Y2O3
Gadolinium Oxide Gd2O3 Praseodymium Oxide Pr6O11 Zinc oxide ZnO
Gallium Oxide Ga2O3 Samarium Oxide Sm2O3 Zirconium oxide ZrO2
Ga2O3 doped ZnO (GZO) Scandium Oxide Sc2O3 Zirkonoxid stabilized Yttrium ZrO2 -Y2O3 stabilized (YSZ)
Hafnium Oxide HfO2 Silicon dioxide SiO2
Hafnium Yttrium Oxide HfO2-Y2O3 Silicon monoxide SiO
Holmium Oxide Ho2O3 Strontium Titanate SrTiO3
Indium Oxide In2O3 Silicon dioxide SiO2
Indium Tin Oxide ITO