Boride Sputtering Targets


Shape: discs, plate, rod, tube, sheet, Delta, and per drawing

Specifications:

Diameter: 355.6mm (14") max.

Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm,

Sputtering targets making method: 

hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering

If larger size than this is needed, we can also provide tiles joint by 45 degree or 90 degree.

   We have only listed popular materials. Please feel free to contact us with any special requirements.

Boride Sputtering Targets

Material Name Formula purity
Chromium Boride CrB, CrB2, Cr5B3  99.5%
Hafnium Boride HfB2  99.5%
Lanthanum Boride LaB6  99.9%
Molybdenum Diboride Mo2B  99.5%
Neodymium Boride NdB6 NdB  99.5%
Tantalum Boride TaB2  99.5%
Titanium Boride TiB2  99.5%
Tungsten Boride WB, WB2, W2B5
Vanadium Boride VB2  99.5%
ZrB2  99.5%