Carbide Sputtering Targets
Shape: discs, plate, rod, tube, sheet, Delta, and per drawing
Specification:
Diameter: 355.6mm (14") max.
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm,
Sputtering targets making method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
If larger size than this is needed, we can also provide tiles joint by 45 degree or 90 degree.
We have only listed popular materials. Please feel free to contact us with any special requirements.
Carbide Sputtering Targets
| Material Name | Formula | Purity |
|---|---|---|
| Boron carbide | B4C | 99.5% |
| Chromium Carbide | Cr2C3 | 99.5% |
| Hafnium Carbide | HfC | 99.5% |
| Molybdenum carbide | Mo2C | 99.5% |
| Niobium Nitride (NbC) | NbC | 99.5% |
| Silicide Carbide | SiC | 99.5% |
| Tantalum Carbide | TaC | 99.5% |
| Titanium Carbide | TiC | 99.5% |
| Titanium Carbo-Nitride (TiCN) | TiCN | 98%, 99% |
| Tungsten Carbide | WC | 99.5% |
| Tungsten Carbide Doped with Nickel | WC+Ni | 99.5% |
| Tungsten Carbide Doped with Cobalt | WC+Co | 99.5% |
| Vanadium Carbide | VC | 99.5% |
| Zirconium Carbide | ZrC | 99.5% |