Nitride Sputtering Targets
Shape: discs, plate, rod, tube, sheet, Delta, and per drawing
Diameter: 355.6mm (14") max.
Specification:
Single piece Size: Length: <500mm, Width: <250mm, Thickness: >1mm
Sputtering targets making method: hot pressing (HP), hot/cold isostatic pressing (HIP, CIP), and vacuum melting, vacuum sintering
If larger size than this is needed, we can also provide tiles joint by 45 degree or 90 degree.
We have only listed popular materials. Please feel free to contact us with any special requirements.
Nitride Sputtering Targets
| Name | Formula | Purity |
|---|---|---|
| Aluminum Nitride | AlN | 99.9% |
| Boron Nitride | BN | 99.5% |
| Hafnium Nitride | HfN | 99.5% |
| Niobium Nitride | NbN | 99.5% |
| Tantalum Nitride | TaN | 99.5% |
| Titanium Nitride | TiN | 99.5% |
| Titanium Carbo-Nitride | TiCN | 98%, 99% |
| Silicon Nitride | Si3N4 | 99.5% |
| Zirconium Nitride | ZrN | 99.5% |